Centro de Componentes Semicondutores
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Centro de Componentes Semicondutores
  • Home
    • History
  • Getting started
    • Entry form
  • Facilities
  • Users
  • Staff
  • Education
  • Booking
  • News
  • Webmail
  • Home
  • Facilities
  • CPD

CPD

photo ICP_cc

Equipment: CPD tousimis 931 Series (link externo) – Grant: Fapesp (Proc.: 2012/17765-7)

Manager: Fred Cioldin

Backup Manager:

Description: The CPD (Critical Point Dryer), is used to dry samples with weak or floppy structures. During conventional drying, the liquid to-be-dryied surface tension can physically damage movable micro- and nano-structures. The CPD process takes place using the critical point of carbon dioxide (CO2).

Resources: 

Samples: maximum dimensions of 10×10 mm

Quantity: 05 samples per batch;

Restrictions: All samples must be submerged on IPA (isopropanol alchool) for the CPD to works.

Other information: 

 

Notícias

  • November 2016
  • April 2013
  • September 2012

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